IEEE Japan Council

2005 New Fellows

No. Section Name Professional Affiliation Citation
1 Kansai Minoru Asada Osaka Univ. For contributions to robot leaning and applications.
2 Tokyo Kouichi Asatani Kogakuin Univ. For contributions to optical networking and standards, commuations quality of service, and network performance.
3 Tokyo Yoshizumi Eto Hitachi Kokusai Electric Inc. For contributions to digital high definition television recording and standards.
4 Tokyo Masaharu Fujita Tokyo Metropolitan Institute of Technoligy For contributions to digital high definition television recording and standards.
5 Tokyo Shinta Fukui Mitsubishi Electric Corp. For contributions to secure power network opetration technologies using intelligent systems.
6 Tokyo Kenya Hashimoto Chiba Univ. For contributions to simulation and design for surface acoustic wave devices.
7 Tokyo Yoichi Hori University of Tokyo For contributions to advanced motion control.
8 Tokyo Nobutake Imamura Terrahouse Co., Ltd For contributions to development and commercialization of magneto-optical recording media and read/write systems.
9 Tokyo Hiroaki Inoue Opnext Inc. For contributions to semiconductor optical switches and modulators.
10 Tokyo Koichiro Ishibashi Renesas Technology Corp. For technical contributions to developments of low-power SRAMs and MCUs.
11 Tokyo Tadao Ishibashi NTT Elecrtonics Corp. For contributions to high-speed and optoelectronic semiconductor devices.
12 Tokyo Koichi Ito Chiba Univ. For contributions to the development of antennas for mobile communications and medical applications.
13 Tokyo Nobuhiko Kitawaki Tsukuba Univ. For contributions to speech quality assesment for low bit rate encoders and associated standards.
14 Kansai Masaaki Kuzuhara NEC For contributions to Group III-V microwave power device.
15 Tokyo Kenichi Mase Niigata Univ. For contributions to communications network traffic control.
16 Nagoya Akira Mizuno Institute of Molecular Science For the reduction of gaseous pollutions.
17 Tokyo Hisayo Momose Tohshiba Corp. For contributions to ultra-thin gate oxide metal oxide semiconductor fields effect trasistors.
18 Tokyo Hidehito Obayashi Hitachi High-Technologies Corp. For contributions to critical dimension scanning election microscopy.
19 Tokyo Shingo Ohmori NICT For contributions to mobile satellite communication systems.
20 Kansai Yutaka Ohmori Osaka Univ. For contributions to the development of organic and semiconductor light emitting materials and devices.
21 Tokyo Shinji Okazaki Super Advanced Electronics Technologies For contributions to the resolution enhancement technology in optical and electron-beam lithography.
22 Kansai Tatsuro Takahashi Ktoyo Univ. For contributions to the technology and systems for asynchronous transfer mode networks.
23 Tokyo Hidehiko Tanaka Institute of Infomation Security For contributions tohigh performance computation models.
24 Kansai Shoji Tominaga Osaka Electro-Communication Univ. For contributions to the analysis of physical phenomena in digital color imaging.
25 Tokyo SKazuno Yano Central Reserch Laboratory,Hitachi Ltd. For contributions to nanostructured-silicon devices and circuits and advanced CMOS logic.
26 Tokyo Hiroshi Saito NTT For contributions to traffic control for integrated packet networks.